High-rate Ru electrode etching using O2/Cl2 inductively coupled plasma
Hyoun Woo Kim, Byong-Sun Ju, Chang-Jin KangVolume:
65
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(02)00962-0
File:
PDF, 571 KB
english, 2003