Growth and characterization of Al2O3 gate dielectric films by low-pressure metalorganic chemical vapor deposition
Qi-Yue Shao, Ai-Dong Li, Hui-Qin Ling, Di Wu, Yuan Wang, Yan Feng, Sen-Zu Yang, Zhi-Guo Liu, Mu Wang, Nai-Ben MingVolume:
66
Year:
2003
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(02)01009-2
File:
PDF, 226 KB
english, 2003