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Ex situ n and p doping of vertical epitaxial short silicon nanowires by ion implantation
Kanungo, Pratyush Das, Kögler, Reinhard, Nguyen-Duc, Kien, Zakharov, Nikolai, Werner, Peter, Gösele, UlrichVolume:
20
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/20/16/165706
Date:
April, 2009
File:
PDF, 1.15 MB
english, 2009