An Analytical Treatment on the Pattern Formation Process by...

An Analytical Treatment on the Pattern Formation Process by Sputter Etching with a Mask

Matsuo, Seitaro
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Volume:
15
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.15.1253
Date:
July, 1976
File:
PDF, 217 KB
english, 1976
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