Low-Temperature Ti-Silicide Forming Reaction in Very Thin...

Japanese Journal of Applied Physics 1985 / 5 Vol. 24; Iss. Part 1, No

Low-Temperature Ti-Silicide Forming Reaction in Very Thin Ti-SiO 2 /Si(111) Contact Systems

Iwami, Motohiro
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Volume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.530
Date:
May, 1985
File:
PDF, 640 KB
english, 1985
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