Thermal Stability of Hydrogen in Silicon Nitride Films...

Japanese Journal of Applied Physics 1988 / 4 Vol. 27; Iss. Part 1, No

Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method

Hirao, Takashi, Kamada, Takeshi, Kitagawa, Masatoshi, Setsune, Kentaro, Wasa, Kiyotaka, Matsuda, Akihisa, Tanaka, Kazunobu
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Volume:
27
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.528
Date:
April, 1988
File:
PDF, 1.18 MB
english, 1988
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