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Si/SiO x /Si Hole-Barrier Fabrication for Bipolar Transistors Using Molecular Beam Deposition
Tatsumi, Toru, Niino, Taeko, Sakai, Akira, Hirayama, HiroyukiVolume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.L1678
Date:
October, 1989
File:
PDF, 3.39 MB
english, 1989