The Role of Hydrogen Atoms in Afterglow Deposition of...

Japanese Journal of Applied Physics 1990 / 11 Vol. 29; Iss. Part 2, No

The Role of Hydrogen Atoms in Afterglow Deposition of Silicon Thin Films

Meikle, Scott, Nakanishi, Yoichiro, Hatanaka, Yoshinori
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L2130
Date:
November, 1990
File:
PDF, 172 KB
english, 1990
Conversion to is in progress
Conversion to is failed