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Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
Kanoh, Hiroshi, Yasukawa, Masahiro, Sugiura, Osamu, Breddels, Paul A., Matsumura, MasakiyoVolume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L2366
Date:
December, 1990
File:
PDF, 146 KB
english, 1990