A novel nanoscale resist using 10-undecanoic acid...

Microelectronic Engineering 1999 Vol. 47; Iss. 1-4

A novel nanoscale resist using 10-undecanoic acid monolayers on silicon dioxide

M.N. Kozicki, S.-J. Yang, T. Kim, B. Kardynal
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Volume:
47
Year:
1999
Language:
english
Pages:
3
DOI:
10.1016/s0167-9317(99)00204-x
File:
PDF, 243 KB
english, 1999
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