Measurement of SiH 2 Densities...

Japanese Journal of Applied Physics 1992 / 8 Vol. 31; Iss. Part 1, No

Measurement of SiH 2 Densities in an RF-Discharge Silane Plasmae Used in the Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Film

Tachibana, Kunihide, Shirafuji, Tatsuru, Matsui, Yasuji
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Volume:
31
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.2588
Date:
August, 1992
File:
PDF, 209 KB
english, 1992
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