Preparation of Polycrystalline Silicon Thin Films by...

Japanese Journal of Applied Physics 1993 / 9 Vol. 32; Iss. Part 1, No

Preparation of Polycrystalline Silicon Thin Films by Cathode-Type RF Glow Discharge Method

Jayatissa, Ahalapitiya Hewage, Nakanishi, Yoichiro, Hatanaka, Yoshinori
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.3729
Date:
September, 1993
File:
PDF, 631 KB
english, 1993
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