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Sub-100 nm Patterning of GaAs Using In Situ Electron Beam Lithography
Kawanishi, Hidenori, Sugimoto, Yoshimasa, Tanaka, Nobuyuki, Ishikawa, TomonoriVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.4033
Date:
September, 1993
File:
PDF, 438 KB
english, 1993