Stress-Enhanced Diffusion of Boron at the Interface of a Directly Bonded Silicon Wafer
Ishigami, Shun-ichiro, Kawai, Yukio, Furuya, Hisashi, Shingyouji, TakayukiVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.4408
Date:
October, 1993
File:
PDF, 236 KB
english, 1993