Fast Electron Beam Lithography System with 1024 Beams...

Japanese Journal of Applied Physics 1993 / 12 Vol. 32; Iss. Part 1, No

Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array

Yasuda, Hiroshi, Arai, Soichiro, Kai, Jun-ichi, Ooae, Yoshihisa, Abe, Tomohiko, Takahashi, Yasushi, Hueki, Syunsuke, Maruyama, Sigeru, Sago, Satoru, Betsui, Keiichi
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Volume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.6012
Date:
December, 1993
File:
PDF, 1.75 MB
1993
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