Aluminum Film Deposition Using an Ultrahigh-Vacuum Sputtering System
Kiyota, Tetsuji, Toyoda, Satoru, Tamagawa, Kouichi, Yamakawa, HiroyukiVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.930
Date:
February, 1993
File:
PDF, 171 KB
english, 1993