Chemical Kinetics of Chlorine in Electron Cyclotron...

Japanese Journal of Applied Physics 1994 / 7 Vol. 33; Iss. Part 1, No

Chemical Kinetics of Chlorine in Electron Cyclotron Resonance Plasma Etching of Si

Ono, Kouichi, Tuda, Mutumi, Nishikawa, Kazuyasu, Oomori, Tatsuo, Namba, Keisuke
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.4424
Date:
July, 1994
File:
PDF, 1.05 MB
english, 1994
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