Reactive Ion Beam Etching of Indium Phosphide in Electron Cyclotron Resonance Plasma Using Methane/Hydrogen/Nitrogen Mixtures
Sendra, José Ramón, Anguita, JoséVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L390
Date:
March, 1994
File:
PDF, 563 KB
english, 1994