Precursors in Atmospheric-Pressure Chemical Vapor...

Japanese Journal of Applied Physics 1994 / 3 Vol. 33; Iss. Part 2, No

Precursors in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System

Adachi, Motoaki, Okuyama, Kikuo, Tohge, Noboru, Shimada, Manabu, Sato, Jun-ichi, Muroyama, Masakazu
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L447
Date:
March, 1994
File:
PDF, 314 KB
english, 1994
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