$\bf RuO_{2}$ Thin Films as Bottom Electrodes for High...

Japanese Journal of Applied Physics 1994 / 6 Vol. 33; Iss. Part 2, No

$\bf RuO_{2}$ Thin Films as Bottom Electrodes for High Dielectric Constant Materials

Yoshikawa, Kohta, Kimura, Takafumi, Noshiro, Hideyuki, Otani, Seigen, Yamada, Masao, Furumura, Yuji
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L867
Date:
June, 1994
File:
PDF, 725 KB
1994
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