Reliability Improvement of Thin Oxide by Double Deposition Process of Silicon Using Chemical Vapor Deposition
Park, Jin Seong, Cheon, Chae IlVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L921
Date:
July, 1994
File:
PDF, 201 KB
english, 1994