![](/img/cover-not-exists.png)
Effect of Stress on Oxide Edge Shape of Local Oxidation of Silicon for Various Oxidation Temperatures
Okihara, Masao, Kuroda, Shigeki, Itoh, Masahiro, Hirashita, NorioVolume:
34
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.1822
Date:
April, 1995
File:
PDF, 1.10 MB
1995