Examination of Correlation of Surface Morphologies of...

Examination of Correlation of Surface Morphologies of Top-Silicon and Buried Oxide Layers in High-Temperature-Annealed Separation by IMplanted OXygen Wafers

Ishiyama, Toshihiko, Nagase, Masao
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.6019
Date:
November, 1995
File:
PDF, 173 KB
english, 1995
Conversion to is in progress
Conversion to is failed