Improvements of Electrical Characteristics of Hf/p-Si(100)...

Japanese Journal of Applied Physics 1995 / 2 Vol. 34; Iss. Part 1, No

Improvements of Electrical Characteristics of Hf/p-Si(100) Interfaces by H-Termination

Zaima, Shigeaki, Kojima, Jun, Hayashi, Masakazu, Ikeda, Hiroya, Iwano, Hirotaka, Yasuda, Yukio
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Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.741
Date:
February, 1995
File:
PDF, 151 KB
english, 1995
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