Gas Pressure Dependence of AlN Film Properties in...

Japanese Journal of Applied Physics 1996 / 9 Vol. 35; Iss. Part 1, No

Gas Pressure Dependence of AlN Film Properties in Alternating Sputtering System

Tominaga, Kikuo, Ao, Takahiro, Mori, Ichiro, Kusaka, Kazuya, Hanabusa, Takao
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Volume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.4972
Date:
September, 1996
File:
PDF, 383 KB
english, 1996
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