Highly Sensitive and Stress-Free Chemically Amplified Negative Working Resist, TDUR-N9, for 0.1 µm Synchrotron Radiation (SR) Lithography
Tsuboi, Shinji, Yamashita, Yoshio, Mitsui, SoichiroVolume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.L130
Date:
January, 1996
File:
PDF, 383 KB
english, 1996