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SILK compatibility with the IMD process using copper metallization
J.C Maisonobe, G Passemard, C Lacour, Ch. Lecornec, P Motte, P Noël, J TorresVolume:
50
Year:
2000
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(99)00260-9
File:
PDF, 696 KB
english, 2000