Low Temperature (≤550° C...

Japanese Journal of Applied Physics 1997 / 3 Vol. 36; Iss. Part 1, No

Low Temperature (≤550° C ) Fabrication of CMOS TFT's on Rapid-Thermal CVD Polycrystalline Silicon-Germanium Films

Lee, Seo-Kyu, Choe, Seong-Min, Ahn, Chang-Geun, Chung, Wook-Jin, Kwon, Young-Kyu, Kang, Bong-Koo, Kim, Ohyun
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.1389
Date:
March, 1997
File:
PDF, 305 KB
english, 1997
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