Effects of Methyl and Perfluoro-Alkyl Groups on Water...

Japanese Journal of Applied Physics 1997 / 7 Vol. 36; Iss. Part 1, No

Effects of Methyl and Perfluoro-Alkyl Groups on Water Repellency of Silicon Oxide Films Prepared by Microwave Plasma-Enhanced Chemical Vapor Deposition

Hozumi, Atsushi, Kondo, Takahiro, Kajita, Iwao, Sekoguchi, Hiroki, Sugimoto, Nobuhisa, Takai, Osamu
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.4959
Date:
July, 1997
File:
PDF, 358 KB
english, 1997
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