Fabrication of Micro-Marks for Electron-Beam Lithography

Japanese Journal of Applied Physics 1997 / 12 Vol. 36; Iss. Part 1, No

Fabrication of Micro-Marks for Electron-Beam Lithography

Takamatsu, Jun, Nakasugi, Tetsuro, Kato, Yoshimitsu, Shimomura, Naoharu, Sunaoshi, Hitoshi, Hattori, Kiyoshi, Nakajima, Kazuaki, Sugihara, Kazuyoshi, Takigawa, Tadahiro
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Volume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.7523
Date:
December, 1997
File:
PDF, 1.84 MB
1997
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