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A Principle of Deposition of Ultra Low and Uniform Stress Absorber for X-Ray Mask
Kitamura, Kaeko, Yabe, Hideki, Sasaki, Kei, Ami, Shigeto, Kise, Koji, Aya, Sunao, Marumoto, KenjiVolume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.7575
Date:
December, 1997
File:
PDF, 842 KB
1997