Comparison of Carbon, Aluminum, Silicon and Copper Films...

Comparison of Carbon, Aluminum, Silicon and Copper Films Deposited by High Peak Intensity Laser Ablation

Sato, Shunichi, Yoneyama, Toshio, Horaguchi, Takeo
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.L1328
Date:
October, 1997
File:
PDF, 408 KB
english, 1997
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