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Liquid-Phase Deposition of Silicon-Dioxide Films using Tetra-Ethyl Orthosilicate
Usami, Koh-ichi, Hayashi, Shin, Uchida, Yasutaka, Matsumura, MasakiyoVolume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.L97
Date:
January, 1998
File:
PDF, 843 KB
english, 1998