Extensive Control of Plasma Parameters in the Afterglow...

Japanese Journal of Applied Physics 1999 / 7 Vol. 38; Iss. Part 1, No

Extensive Control of Plasma Parameters in the Afterglow Region of Electron-Cyclotron-Resonance Plasma for the Epitaxial Growth of Cubic Gallium Nitride

Yasui, Kanji, Kikuchi, Masaaki, Uwabachi, Atushi, Akahane, Tadashi
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.4329
Date:
July, 1999
File:
PDF, 232 KB
english, 1999
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