Impacts of Self-Aligned Epitaxial Silicon Sliver (SESS) in Buried Channel-pFETs Elevated Source/Drain Using Dual-Spacer Structure
Lee, Jung-Ho, Yeo, In-Seok, Kwak, Heung-Sik, Kim, Chung-TaeVolume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.2151
Date:
April, 2000
File:
PDF, 256 KB
english, 2000