Stress evolution and drift kinetics in confined metal lines

Microelectronic Engineering 2000 Vol. 50; Iss. 1-4

Stress evolution and drift kinetics in confined metal lines

S.A. Chizhik, A.A. Matvienko, A.A. Sidelnikov
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Volume:
50
Year:
2000
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(99)00301-9
File:
PDF, 100 KB
english, 2000
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