Profile Control of SiO 2 Trench...

Japanese Journal of Applied Physics 2001 / 4 Vol. 40; Iss. Part 1, No

Profile Control of SiO 2 Trench Etching for Damascene Interconnection Process

Seta, Shoji, Sekine, Makoto, Hayashi, Hisataka, Yoshida, Yukimasa
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.2501
Date:
April, 2001
File:
PDF, 448 KB
english, 2001
Conversion to is in progress
Conversion to is failed