![](/img/cover-not-exists.png)
Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition
Liu, Haiping, Jung, Sughoan, Fujimura, Yukihiro, Toyoshima, Yasutake, Shirai, HajimeVolume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.L215
Date:
March, 2001
File:
PDF, 175 KB
english, 2001