Growth of Crystal Silicon Films from Chlorinated Silanes by...

Japanese Journal of Applied Physics 2001 / 3 Vol. 40; Iss. Part 2, No

Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition

Liu, Haiping, Jung, Sughoan, Fujimura, Yukihiro, Toyoshima, Yasutake, Shirai, Hajime
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.L215
Date:
March, 2001
File:
PDF, 175 KB
english, 2001
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