Flattening of Surface by Sputter-Etching with Low-Energy...

Japanese Journal of Applied Physics 2001 / 5 Vol. 40; Iss. Part 2, No

Flattening of Surface by Sputter-Etching with Low-Energy Ions

Matsutani, Takaomi, Iwamoto, Keigo, Nagatomi, Takaharu, Kimura, Yoshihide, Takai, Yoshizo
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.L481
Date:
May, 2001
File:
PDF, 259 KB
english, 2001
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