Hot-Carrier Lifetime Dependence on Channel Width and Silicon Recess Depth in N-Channel Metal-Oxide-Semiconductor Field-Effect-Transistors with the Recessed Local Oxidation of Silicon Isolation Structure
Chim, Wai Kin, Cho, Byung Jin, Yue, Jeffrey Mun PunVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.47
Date:
January, 2002
File:
PDF, 190 KB
english, 2002