Dual Damascene Interconnect Technology for 130-nm-node...

Japanese Journal of Applied Physics 2003 / 9 Vol. 42; Iss. Part 1, No

Dual Damascene Interconnect Technology for 130-nm-node Complementary Metal–Oxide–Semiconductor Devices Using Ladder-Oxide Film

Yokoyama, Takashi, Shiba, Kazutoshi, Nishizawa, Atsushi, Nagahara, Seiji, Yamato, Hidekazu, Usami, Tatsuya, Watanabe, Susumu, Nakabeppu, Kenichi, Kunimune, Yorinobu, Sekine, Makoto, Oda, Noriaki, Hori
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.5543
Date:
September, 2003
File:
PDF, 132 KB
english, 2003
Conversion to is in progress
Conversion to is failed