Structural Evaluation of Cu Films Grown by Cl...

Japanese Journal of Applied Physics 2003 / 11 Vol. 42; Iss. Part 1, No

Structural Evaluation of Cu Films Grown by Cl 2 Plasma

Ohba, Yoshiyuki, Sakamoto, Hitoshi, Ogura, Yuzuru, Yahata, Naoki, Nishimori, Toshihiko, Hatayama, Kenichiro
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.6820
Date:
November, 2003
File:
PDF, 351 KB
english, 2003
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