Fabrication of 50 nm Trigate Silicon On Insulator Metal–Oxide–Silicon Field-Effect Transistor without Source/Drain Activation Annealing
Im, Kiju, Cho, Won-Ju, Ahn, Chang-Geun, Yang, Jong-Heon, Oh, Jihun, Lee, Seongjae, Hwang, HyunsangVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.2438
Date:
May, 2004
File:
PDF, 168 KB
english, 2004