Design and Fabrication of MOS Device Circuits with Reticle-Free Exposure Method
Wakasugi, Katsuhiko, Wakimoto, Satoshi, Nakada, Akira, Ohshima, Ichiro, Kubota, Hiroshi, Nakamura, KazumitsuVolume:
44
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2279
Date:
April, 2005
File:
PDF, 651 KB
2005