Hydrogen and Oxygen Plasma Effects on Undoped and n–p...

Japanese Journal of Applied Physics 2005 / 5 Vol. 44; Iss. 5A

Hydrogen and Oxygen Plasma Effects on Undoped and n–p Compensation-doped Single- and Multilayer Polycrystalline Silicon Resistor Films

Liou, Bor Wen, Chang, Shu Cheng, Wang, Shui Jinn
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2929
Date:
May, 2005
File:
PDF, 335 KB
english, 2005
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