Structural Characterization of Si 0.75...

Japanese Journal of Applied Physics 2005 / 5 Vol. 44; Iss. 5A

Structural Characterization of Si 0.75 Ge 0.25 Alloy Layers with Sb/Ge-Mediated Low Temperature-grown Si Buffers

Rahman, Mohammad Mizanur, Zhang, Shuqi, Tambo, Toyokazu, Tatsuyama, Chiei
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2967
Date:
May, 2005
File:
PDF, 784 KB
english, 2005
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