Frictional and Removal Rate Studies of Silicon Dioxide and...

Frictional and Removal Rate Studies of Silicon Dioxide and Silicon Nitride CMP Using Novel Cerium Dioxide Abrasive Slurries

Zhuang, Yun, King, Deanna, Kido, Takanori, Philipossian, Ara
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.30
Date:
January, 2005
File:
PDF, 190 KB
english, 2005
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