Low-Temperature Fabrication of Ultrathin ZrO...

Japanese Journal of Applied Physics 2005 / 1 Vol. 44; Iss. 1A

Low-Temperature Fabrication of Ultrathin ZrO 2 /Si Structure Using Metal Deposition Followed by Oxygen Annealing

Nagasato, Yoshitaka, Aya, Tsutomu, Iwazaki, Yoshitaka, Hasumi, Masahiko, Ueno, Tomo, Kuroiwa, Koichi
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.5
Date:
January, 2005
File:
PDF, 432 KB
english, 2005
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