Large-Area X-ray Lithography System for LIGA Process Operating in Wide Energy Range of Synchrotron Radiation
Utsumi, Yuichi, Kishimoto, Takefumi, Hattori, Tadashi, Hara, HirotsuguVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.5500
Date:
July, 2005
File:
PDF, 46 KB
english, 2005