Improving High-κ Gate Dielectric Properties by High-Pressure Water Vapor Annealing
Punchaipetch, Prakaipetch, Miyashita, Makoto, Uraoka, Yukiharu, Fuyuki, Takashi, Sameshima, Toshiyuki, Horii, SadayoshiVolume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.L120
Date:
January, 2006
File:
PDF, 536 KB
english, 2006